Title:
EXPOSURE APPARATUS
Document Type and Number:
Japanese Patent JP2018116289
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of precisely synchronously driving a mask and a substrate.SOLUTION: The exposure apparatus includes: a rotating drum having a cylindrical outer peripheral surface of a definite radius from a first axis line for transferring a substrate in a longitudinal direction by rotating around the first axis line in a state of rolling a part of the substrate in a longitudinal direction to the outer peripheral surface; a mask holding mechanism for holding a plurality of cylindrical masks formed with a mask pattern along an outer peripheral surface cylindrically-curved with a predetermined radius from the second axis line, and rotatable around the second axis line separately in a width direction intersecting with a longitudinal direction of the substrate and in a circumferential direction of the outer peripheral surface of the rotating drum in a state of paralleling the second axis line with the first axis line, and for setting the mask pattern formed on each of the outer peripheral surfaces of a plurality of the cylindrical masks and the surface of the substrate supported by the rotating drum into a predetermined distance; and a driving part for generating rotating thrust force for rotating each of the cylindrical masks around the second axis line, and translation thrust force for slightly moving in a direction parallel with the second axis line.SELECTED DRAWING: Figure 1
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Inventors:
SUZUKI TOMOYA
KOMIYAMA HIROKI
KOMIYAMA HIROKI
Application Number:
JP2018034252A
Publication Date:
July 26, 2018
Filing Date:
February 28, 2018
Export Citation:
Assignee:
NIKON CORP
International Classes:
G03F7/24; H01L21/68
Domestic Patent References:
| JP2017126084A | 2017-07-20 |
Attorney, Agent or Firm:
Nishizawa Kazumi
Kazunori Onami
Junichi Kobayashi
Kazunori Onami
Junichi Kobayashi
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