EXPOSURE DEVICE

Japanese Patent JP3619314

B2

PROBLEM TO BE SOLVED: To expose large-sized glass substrates in an erecting state.
SOLUTION: This exposure device has the exposure regions where the substrates 1, 1', 1" are carried in, are subjected to exposure processing and are ejected. The substrates are carried by a carrying-in means 6 to a first station No.1 of the exposure region in a horizontal state (stage A). The substrates are erected by a substrate erecting means 7 (stage C). The erected substrates are transferred to a transfer device 8 (stage E) and are sent to a second station No.2 (stage A). The substrates are handed in the second stage No.2 to a substrate holding plate 10 (stage B) and is subjected to the exposure processing by irradiation with light 5 (stage C). The substrates after the exposure processing are again handed to the transfer device 8 (stage D) and are sent to a third station No.3. The substrates are handed to a substrate laying down means 11 in a third station No.3 where the substrates are returned to the horizontal state by the substrate laying down means 11. The substrates are thereafter ejected outside the exposure region by an ejecting means 12.

JP2008175961	INPUT DEVICE
JP4377479	Plane display device
JP2001209036	LIQUID CRYSTAL DEVICE, METHOD OF MANUFACTURE AND PROJECTION DISPLAY DEVICE

Eiichi Miyake

JP5337896A

February 09, 2005

March 11, 1996

Click for automatic bibliography generation  

San-A Giken Co., Ltd.

G02F1/1333; G03F7/20; H01L21/027; (IPC1-7): G03F7/20; G02F1/1333; H01L21/027

JP62188773U
JP4350857A

Kazuo Shamoto
Shosuke Imai
Tadashi Masui
Tadahiko Kurita
Yasushi Kobayashi

Previous Patent: AUTOMATIC INSPECTION METER

Next Patent: IMAGE FORMING DEVICE AND ITS FEEDING/DELIVERING MECHANISM