Title:
露光装置
Document Type and Number:
Japanese Patent JP5381029
Kind Code:
B2
Abstract:
An exposure device is provided. The exposure device includes an alignment stage unit, an exposure processing unit and a workpiece moving mechanism. The alignment stage unit includes: an alignment stage that holds a workpiece having workpiece marks thereon; at least one first alignment microscope that detects the workpiece marks of the workpiece; and a first moving mechanism that relatively moves the alignment stage and the first alignment microscope in an 1-axis direction by a width of the workpiece. The exposure processing unit includes: a mask stage that holds a mask having mask marks thereon; a second alignment microscope that detects the mask marks of the mask: and an exposure stage that holds the workpiece. The workpiece moving mechanism moves the workpiece from the alignment stage unit to the exposure processing unit,
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Inventors:
Yoshihiko Sato
Toyoji Inoue
Toyoji Inoue
Application Number:
JP2008287414A
Publication Date:
January 08, 2014
Filing Date:
November 10, 2008
Export Citation:
Assignee:
Ushio, Inc.
International Classes:
H01L21/027; G03F9/00
Domestic Patent References:
| JP9251952A | ||||
| JP2007103658A | ||||
| JP2003273005A | ||||
| JP8220769A | ||||
| JP4350857A | ||||
| JP2000267294A | ||||
| JP2005026287A | ||||
| JP2005092137A | ||||
| JP7128869A | ||||
| JP2009223447A |
Attorney, Agent or Firm:
Shunichiro Nagasawa