Title:
EXPOSURE EQUIPMENT
Document Type and Number:
Japanese Patent JP2015079816
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide exposure equipment capable of obtaining stable image performance and high throughput while preventing thermal deformation of a glass substrate.SOLUTION: Temperature of a glass substrate (14) is controlled so as to become the same temperature distribution as that of a substrate chuck by suspending and holding the glass substrate (14) with a plurality of Bernoulli chucks (15) including: temperature detection means (21) for detecting temperature of the substrate chuck and the glass substrate (14) with the same element; and temperature control means (23) for controlling temperature of supplied compressed air (19).
Inventors:
SEKINE HIROKAZU
Application Number:
JP2013215197A
Publication Date:
April 23, 2015
Filing Date:
October 16, 2013
Export Citation:
Assignee:
CANON KK
International Classes:
H01L21/027; H01L21/677
Attorney, Agent or Firm:
Yukio Takanashi
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