Title:
EXPOSURE METHOD AND EXPOSURE DEVICE AS WELL AS MASK
Document Type and Number:
Japanese Patent JP2000199973
Kind Code:
A
Abstract:
To execute exposure with a smaller number of sheets, even at the time of executing exposure processing accompanied by screen compositing.
A first pattern and a second pattern are joined and are exposed to a substrate by using a mask A having patterns 1a. The patterns of the mask A have a common pattern KP of the first pattern and second pattern and non- common patterns HP1 and HP2 different from the common pattern KP formed by connection to the common pattern KP. The common pattern KP and at least part of the non-common patterns HP1 and HP2 are selected and joined, and the exposure is executed.
Inventors:
IGUCHI MASAHIRO
MACHINO KATSUYA
HORI KAZUHIKO
TOGUCHI MANABU
MACHINO KATSUYA
HORI KAZUHIKO
TOGUCHI MANABU
Application Number:
JP16026799A
Publication Date:
July 18, 2000
Filing Date:
June 07, 1999
Export Citation:
Assignee:
NIKON CORP
International Classes:
G03F1/70; G03F7/20; G03F9/00; H01L21/027; (IPC1-7): G03F9/00; G03F1/08; G03F7/20; H01L21/027
Attorney, Agent or Firm:
Masatake Shiga (5 outside)