Title:
EXPOSURE SYSTEM FOR CIRCUMFERENTIAL PART OF SUBSTRATE
Document Type and Number:
Japanese Patent JP3525976
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a circumferential part exposure system for substrate in which unnecessary resist can be exposed accurately at the circumferential part of a substrate.
SOLUTION: The inventive exposure system exposes a resist applied to a substrate W in a specified circumferential exposing region on the surface of the substrate W applied with resist. A control section controls a biaxial displacement mechanism to shift a spot light SL from a light irradiation means along two line components of outline of the circumferential exposing region based on a line data being obtained thus displacing the spot light SL and the substrate W relatively in the orthogonal X-axis and Y-axis directions.
Inventors:
Yamamoto, Satoshi
Kamei, Kenji
Kamei, Kenji
Application Number:
JP16864896A
Publication Date:
May 10, 2004
Filing Date:
June 06, 1996
Export Citation:
Assignee:
DAINIPPON SCREEN MFG CO LTD
International Classes:
G03F7/20; H01L21/027; H01L21/68; (IPC1-7): H01L21/027; G03F7/20
Attorney, Agent or Firm:
杉谷 勉