To provide an F2 excimer laser capable of producing laser pulses with pulse energies greater than 10 mJ at wavelength in the range of 157 nm, at repetition rates in the range of 1,000 to 2,000 Hz.
Using a laser, which is operated in the range of 1000 to 4000 Hz with energies, or pulse energies in the range of 10 to 5 mJ, as an illumination source, a stepper or a scanner equipment can produce integrated circuit resolution of 0.1 μm or less. In a preferred embodiment, the laser was tuned to the Fluorine 157.6 nm line using a set of two external prisms. In a second preferred embodiment, the laser is operated broad band and the 157.6 nm line is selected external to the resonance cavity. In a preferred embodiment, a line width of 0.2 pm is provided using injection seeding.
COPYRIGHT: (C)2008,JPO&INPIT
SANDSTROM RICHARD L
THOMAS P DAFFY
| JPH098389A | 1997-01-10 | |||
| JPH022188A | 1990-01-08 | |||
| JP2008022026A | 2008-01-31 |
| DE4015861A1 | 1991-11-21 |
Fumiaki Otsuka
Sadao Kumakura
Shishido Kaichi
Nobuo Ogawa
Takaki Nishijima
Atsushi Hakoda
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