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Title:
FERROELECTRIC MATERIAL CAPACITOR AND SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP3971598
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To improve fatigue characteristic and imperfect imprinting by enhancing retention characteristic of a ferroelectric substance capacitor in a semiconductor device having the ferroelectric material capacitor.
SOLUTION: In the ferroelectric material capacitor wherein a PZT film is sandwiched between an upper and a lower electrodes, a film composed of tetragonal system PZT crystal having (001) orientation is used as the PZT film, and a layer composed of PZT crystal belonging to rhombohedron system is interposed on an interface between the upper and the lower electrodes.


Inventors:
Masaki Kurasawa
Kenji Maruyama
Application Number:
JP2001336576A
Publication Date:
September 05, 2007
Filing Date:
November 01, 2001
Export Citation:
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Assignee:
富士通株式会社
International Classes:
H01L21/8246; H01L27/105; H01L21/02; H01L27/115; (IPC1-7): H01L27/105
Domestic Patent References:
JP4171976A
JP11330411A
JP6089986A
JP2001196652A
JP10214945A
JP5343697A
JP2000208828A
JP6021338A
JP2000068464A
JP6021337A
Attorney, Agent or Firm:
Tadahiko Ito