Title:
FILM DEPOSITION APPARATUS
Document Type and Number:
Japanese Patent JP2012201900
Kind Code:
A
Abstract:
To provide a film deposition apparatus capable of depositing a multilayered film, wherein the size of the entire apparatus can be reduced.
The film deposition apparatus is structured to deposit a film onto an inner surface of a substrate to be treated while winding the substrate around a deposition treatment drum at a prescribed angle and continuously or intermittently transferring the substrate, so that the size of the entire apparatus is reduced. The multilayered film can be readily deposited by rotating a rotary drum equipped with a film deposition source in the deposition treatment drum.
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Inventors:
KON MASATO
Application Number:
JP2011064922A
Publication Date:
October 22, 2012
Filing Date:
March 23, 2011
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD
International Classes:
C23C16/54; C23C16/455
Attorney, Agent or Firm:
Patent business corporation Ogasawara patent office