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Title:
FILM DEPOSITION APPARATUS
Document Type and Number:
Japanese Patent JP2014159607
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a film deposition apparatus excellent in utilization efficiency of film deposition material.SOLUTION: A film deposition apparatus 1 dissolves particulate material 3 being particulate film deposition material to deposit a film on a base material 2, and includes a feeding mechanism 21 feeding a film deposition position P of a base material 2 with particulate material 3, a treatment medium feeding mechanism 10 emitting a laser beam 15 for heating and fusing the film deposition material toward the film deposition position P of the base material 2, and a recovery mechanism 25 recovering the particulate material 3 having passed through the film deposition position P of the base material 2.

Inventors:
SAKAMOTO HARUHISA
OTSUBO TOSHIYUKI
Application Number:
JP2013029687A
Publication Date:
September 04, 2014
Filing Date:
February 19, 2013
Export Citation:
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Assignee:
SOPHIA SCHOOL CORP
KOKUSAI SENTAN GIJUTSU CONSULTING CO LTD
International Classes:
C23C4/12; C23C24/08
Domestic Patent References:
JP2011168840A2011-09-01
JP2012017486A2012-01-26
JP2006334563A2006-12-14
JP2004504140A2004-02-12
JP2001335915A2001-12-07
Attorney, Agent or Firm:
Patent business corporation クシブチ international patent firm



 
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