To provide a film deposition device, wherein interference of magnetic fields from magnets each arranged on the back side of a plurality of targets hardly occurs in a plasma generation space.
The film deposition device includes: a vacuum tank capable of maintaining a reduced pressure lower than an atmospheric pressure; a support base arranged inside the vacuum tank to support a substrate; a plurality of targets disposed on the main surface of the support base while putting their surfaces face to face via a discharge space; the magnets respectively arranged on the back side of a plurality of targets; and a reduction means reducing the magnetic field, which proceeds from at least one of the magnets to the discharge space, between the magnet and the discharge space.
KOGURE KIMIO
ONODA TOSHIYASU
| JP2005048222A | 2005-02-24 | |||
| JP2007284794A | 2007-11-01 |
Junichi Kozaki
Hiroshi Ichikawa
Soichi Homma
Yukinobu Hibino
Tatsutetsu Shirai
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