Title:
FILM DEPOSITION MASK, AND METHOD FOR MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2004225126
Kind Code:
A
Abstract:
To provide a film deposition mask of less distortion which is used to deposit a thin film layer on a substrate, and a manufacturing method for the same.
The film deposition mask 1 comprises a mask part 4 having a plurality of straight wires 5, and a frame 3 to fix the mask part 4. The mask part 4 has apertures 7. The apertures 7 are provided by removing a part of the straight wires 5 which are closely disposed side by side in advance.
Inventors:
CHUMA TAKASHI
UCHIDA YOSHIHIKO
SATO HIDEO
HATA TAKUYA
YOSHIZAWA ATSUSHI
UCHIDA YOSHIHIKO
SATO HIDEO
HATA TAKUYA
YOSHIZAWA ATSUSHI
Application Number:
JP2003015935A
Publication Date:
August 12, 2004
Filing Date:
January 24, 2003
Export Citation:
Assignee:
PIONEER ELECTRONIC CORP
International Classes:
C23C14/04; G03F1/20; H01L51/50; H05B33/10; G03F7/12; (IPC1-7): C23C14/04; H05B33/10; H05B33/14
Attorney, Agent or Firm:
Motohiko Fujimura