Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
被膜形成方法
Document Type and Number:
Japanese Patent JP6970168
Kind Code:
B2
Abstract:
To provide a coating film formation method in which superior water-absorption resistance, durability, aesthetic appearance and the like are imparted to an inorganic material.SOLUTION: A coating film formation method includes: a first step of applying a permeable water-absorption preventive material to a surface of an inorganic material; then, a second step of applying a coating material (I) which contains a synthetic resin emulsion and a pigment, and in which a concealing factor of a formed coating film is 90% or higher, to the surface of an inorganic material; and a third step of applying a coating material (II) which contains a synthetic resin and a pigment, and imparting a pattern, to the surface of an inorganic material. The synthetic resin emulsion of the coating material (I) contains a (meth)acrylic acid alkyl ester having a homopolymer glass-transition temperature of 50°C or higher, and a solubility parameter of 9.5 or lower, as a monomer for composing the synthetic resin. The coating material (II) is applied by using a roller brush in which at least two or more kinds of liquid-absorbing materials having different hardness and/or density are mixed and present on its cylindrical outer peripheral surface.SELECTED DRAWING: None

Inventors:
Keisuke Mizushima
Satoshi Kitao
Hironao Morimoto
Application Number:
JP2019225004A
Publication Date:
November 24, 2021
Filing Date:
December 13, 2019
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Beck Co., Ltd.
International Classes:
B05D1/28; B05D1/36; B05D5/00; B05D5/06; B05D7/00; B05D7/24
Domestic Patent References:
JP2005305327A
JP2006015326A
JP2007268386A
JP54096544A
JP2003251269A
JP2008012454A
JP2009050841A
Foreign References:
US20020029435
US20030074758