Title:
FINISHING AGENT FOR RESIST PATTERN FORMATION AND RESIST PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2004069962
Kind Code:
A
Abstract:
To improve adhesion to a substrate and to form a pattern for a high liftoff process.
The finishing agent for resist pattern formation is applied to a substrate before a pattern for a liftoff process is formed on the substrate using a chemically amplified negative resist material. The finishing agent consists mainly of a product obtained by partially hydrolyzing and condensing an alkoxysilane compound and includes a product obtained by partially hydrolyzing and condensing an alkoxysilane compound having a nitrogen-containing group.
Inventors:
KATO HIDETO
NODA KAZUMI
FUJII TOSHIHIKO
NODA KAZUMI
FUJII TOSHIHIKO
Application Number:
JP2002228432A
Publication Date:
March 04, 2004
Filing Date:
August 06, 2002
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
G03F7/11; G03F7/38; H01L21/027; (IPC1-7): G03F7/38; G03F7/11; H01L21/027
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Saori Shigematsu
Katsunari Kobayashi
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