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Title:
FLUORINE-CONTAINING LACTONE MONOMERIC COMPOUND, FLUORINE-CONTAINING LACTONE POLYMERIC COMPOUND, RESIST FLUID OF THE SAME, AND METHOD FOR PATTERN FORMATION USING THE SAME
Document Type and Number:
Japanese Patent JP2011195818
Kind Code:
A
Abstract:

To provide a resist giving a highly fine and precise pattern by lithography, particularly by immersion lithography, using ultraviolet rays of wavelength 300 nm or lower, a polymeric compound used for the resist, and a monomeric compound contained in the polymeric compound.

A fluorine-containing lactone monomeric compound is represented by general formula (1). In the formula, Rf is a 1C-4C straight-chain perfluoroalkyl group.


Inventors:
NADANO AKIRA
AKIBA SHINYA
MIYAUCHI KOICHI
Application Number:
JP2011032026A
Publication Date:
October 06, 2011
Filing Date:
February 17, 2011
Export Citation:
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Assignee:
CENTRAL GLASS CO LTD
International Classes:
C08F20/28; G03F7/039; H01L21/027
Domestic Patent References:
JP2005213215A2005-08-11
JP2007204385A2007-08-16
JP2011059516A2011-03-24
Foreign References:
WO2011111641A12011-09-15
Attorney, Agent or Firm:
Makoto Koide



 
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