FLUOROPOLYMER COMPOSITION

Japanese Patent JP3444004

B2

PURPOSE: To obtain a fluoropolymer compsn. having a low steam permeability, an excellent chemical resistance, a low permittivity, etc., and useful for a moistureproof coating material for electronic parts by compounding a fluoropolymer having cyclic structures in the main chain with a low-molecular chlorotrifluorothylene polymer.
CONSTITUTION: This fluoropolymer compsn. is prepd. by compounding 50-99wt.% fluoropolymer (A) having cyclic structures in the main chain (and pref. having a number average mol.wt. enough to be solid at normal temp.) and 1-50wt.% polychlorotrifluoroethylene (B) having a number average mol.wt. (pref. of 500-5000) lower than that of polymer A. A moistureproof coating material is prepd. by compounding polymer A with a low-molecular fluoropolymer [e.g. a polymer represented by formula I or II (wherein X1 to X4 are each CF3, C2F5, or C3F7; and p, g, and m are each an integer)] other than polymer B. The coating material, having an excellent chemical resistance and low steam permeability, permittivity, and surface energy, is useful for electronic parts such as a circuit board.

JP5545639	A fluoro-resin cast and a manufacturing method for the same
JPS52108450	REINFORCEDDBATCH CONTAINING POLYVINYLIDENE FLVORIDE
JPH032408	MIRROR

Norihide Sugiyama
Yamaguchi Mon

JP3261295A

September 08, 2003

February 21, 1995

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Asahi Glass Co., Ltd.

C08L27/12; C08L27/00; C08L29/10; C08L71/00; C08L71/02; C09D5/00; C09D127/12; C09D129/00; C09D129/10; C09D171/00; C09D171/02; H05K3/28; (IPC1-7): C08L27/12; C08L29/10; C08L71/02; C09D5/00; C09D127/12; C09D129/10; C09D171/02

JP85848A
JP7126428A
JP4189862A
JP6322213A
JP4204504A

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