Title:
FORMATION OF ANTIFOULING THIN FILM
Document Type and Number:
Japanese Patent JP3760570
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To stably obtain in high controllability the subject thin film excellent in durability, water repellency and uniformity, and useful in a field such as of optical members, by irradiating the surface of an object base material with vacuum ultraviolet rays while exposing the surface to a specific monomer vapor.
SOLUTION: (A) The surface of an object base material 1 such as antireflection film is irradiated with vacuum ultraviolet rays L (e.g. 100-200 nm in the central wavelength) while exposing the surface to (B) a monomer vapor of a fluoroalkylsilane 2 [e.g. a compound of the formula CF3(CF2)n(CH2)mSiA3 (A is a hydrolyzable group such as ethoxy, methoxy, etc.; (n)>0 (m)≥0)] (for example, at a temperature of 70-200°C) to form the objective thin film of the component B2.
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Inventors:
Hiroki Watanabe
Noritoshi Tomikawa
Itaru Ito
Noritoshi Tomikawa
Itaru Ito
Application Number:
JP16707397A
Publication Date:
March 29, 2006
Filing Date:
June 24, 1997
Export Citation:
Assignee:
Toppan Printing Co., Ltd.
International Classes:
C08J7/12; C08J7/04; C08J7/18; C23C16/48; G02B1/10; G02B1/11; G02B1/12; G02B1/14; G02B1/18; C08L101/00; (IPC1-7): C08J7/04; C23C16/48; G02B1/10; G02B1/12; //C08J7/18
Domestic Patent References:
| JP5239243A |
Attorney, Agent or Firm:
Noboru Tajime
Tajime Keiko
Tajime Keiko