Title:
FULLERENE DERIVATIVE
Document Type and Number:
Japanese Patent JP2023057076
Kind Code:
A
Abstract:
To provide a fullerene derivative that can be synthesized without the need for a special synthesis apparatus and can be subjected to vapor deposition at a temperature low enough to prevent pyrolysis.SOLUTION: According to the present invention, a fullerene derivative has a fullerene skeleton and a partial structure represented by general formula (1) in the figure, where C* are carbon atoms adjacent to each other forming the fullerene skeleton, and Rf1 and Rf2 are trifluoromethyl group.SELECTED DRAWING: None
Inventors:
Takeshi Igarashi
Chieko Nakagawa
Chieko Nakagawa
Application Number:
JP2022198035A
Publication Date:
April 20, 2023
Filing Date:
December 12, 2022
Export Citation:
Assignee:
Resonac Co., Ltd.
International Classes:
C07C23/46; C01B32/156; H10K30/60; H10K30/85; H10K39/32
Attorney, Agent or Firm:
Shu Oikawa
Norihiko Ara
Tomomasa Katsumata
Ryuichiro Majima
Norihiko Ara
Tomomasa Katsumata
Ryuichiro Majima