Title:
気体供給吸引装置およびレーザ処理装置
Document Type and Number:
Japanese Patent JP7210001
Kind Code:
B2
Abstract:
To provide a gas supply and suction apparatus capable of suppressing a deterioration in processing quality, a suction unit, and a laser processing device.SOLUTION: One embodiment of the present invention is a gas supply and suction apparatus that is arranged between an object and an irradiation device for irradiating the object with energy and that performs the supply and suction of gas. The gas supply and suction apparatus comprises a first cylinder part that is extended in an energy irradiation direction, a second cylinder part that is arranged to surround an outer periphery of the first cylinder part, a supply passage for supplying first gas along an inner periphery of the first cylinder part, and a suction passage for sucking in gas along an inner periphery of the second cylinder part.SELECTED DRAWING: Figure 1
Inventors:
Akinobu Hasegawa
Application Number:
JP2018190211A
Publication Date:
January 23, 2023
Filing Date:
October 05, 2018
Export Citation:
Assignee:
Affair Co., Ltd.
International Classes:
B23K26/16
Domestic Patent References:
| JP2001314985A | ||||
| JP2009184009A | ||||
| JP2011020147A | ||||
| JP11006086A | ||||
| JP2005088068A | ||||
| JP2006026671A |
Foreign References:
| WO2008070930A1 |
Attorney, Agent or Firm:
Ichiro Nomura
Previous Patent: Receiver module and optical power supply system
Next Patent: TRANSFERRING AND TRANSPORTING DEVICE
Next Patent: TRANSFERRING AND TRANSPORTING DEVICE