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Title:
GAS SUPPLYING DEVICE FOR FIB ASSIST DEPOSITION DEVICE
Document Type and Number:
Japanese Patent JP3083401
Kind Code:
B2
Abstract:

PURPOSE: To realize a gas supplying device for FIB assist deposition devices which can control the amount of a gas blown upon a material through a nozzle.
CONSTITUTION: Under the condition shown in the figure, one end 36 of an inner container 35 is inserted into an opening 38 and the gas supply to a nozzle 31 is stopped. When the container 35 is moved and the one end of the container 35 comes off from the opening 38, the gas supply to the nozzle 31 is started. When the container 35 is further moved rightward and the exhaust conductance of a valve formed of end faces 40 and 41 is controlled, the amount of the gas blown out from the nozzle 31 can be adjusted. In case the container 35 is further moved rightward in the figure, the other end face 40 of the container 35 comes into contact with the inner end face 41 of an outer container 30 and gas discharging operation from the container 35 is stopped. Therefore, the amount of the gas blown upon a specimen from the nozzle 31 becomes the maximum.


Inventors:
Haruo Kasahara
Application Number:
JP11885792A
Publication Date:
September 04, 2000
Filing Date:
May 12, 1992
Export Citation:
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Assignee:
JEOL Ltd.
International Classes:
C23C16/48; H01L21/205; H01L21/268; H01L21/28; H01L21/285; (IPC1-7): C23C16/48; H01L21/205; H01L21/285
Domestic Patent References:
JP6094728A
JP217642A
JP2504444A
Attorney, Agent or Firm:
Fujishima Ijima (1 outside)