To obtain the polished surface with very few scratches and micro protrusions by dispersing abrasive grains in a water medium containing water soluble resin and acetylene alcohol or its derivative to form a polishing composition.
Abrasive grains are dispersed in a water medium containing water soluble resin and acetylene alcohol or its derivative to form a polishing composition. The acetylene alcohol and its derivative therefore attain excellent defoaming effect with a small quantity without having adverse effect on the dispersibility of abrasive grains and can easily removed from a base. While feeding this polishing composition to abrasive cloth, this abrasive cloth is brought into contact with the Ni-P plating of a hard disc base, rotated at about 50-300rpm, to perform polishing.
HASHIMOTO KIICHI
CHINO MIYUKI
Next Patent: CURVED SURFACE FORMING AND POLISHING DEVICE AND METHOD