To provide a heat treatment device for heat treatment of a board or the like, capable of performing heat treatment equivalent to that by using an infrared radiation heater, and controlling rise of concentration of a produced gas.
A shelf member is mounted in a heat treatment chamber 12, and a far infrared radiation plate 100 is mounted on a rear face of the shelf member. The far infrared radiation plate does not have a function of generating heat by itself, but radiates infrared radiation when heated. The board W loaded on the shelf member is exposed to hot air flowing in the heat treatment chamber and heated, here the far infrared radiation plate is also heated by the hot air and radiates infrared radiation. The board is also heated by the infrared radiation radiated from the far infrared radiation plate. The produced gas is carried by a large mount of hot air and discharged to the outside of the heat treatment chamber.
NAGANO YUKIO
ASHIDA KENJI
