Title:
加熱装置、蒸発源装置、成膜装置、成膜方法および電子デバイスの製造方法
Document Type and Number:
Japanese Patent JP7241603
Kind Code:
B2
Abstract:
The present invention provides a technique for performing proper film formation by satisfactorily heating a deposition material. A heating apparatus heats a container for accommodating a deposition material. The container has an opening part to discharge a heated deposition material, a first area, and a second area which is an area separated from the opening part more than the first area. The heating apparatus comprises: a first heater to heat the first area; a second heater to heat the second area; and a control unit to independently control the first heater and the second heater. The second heater includes a first portion and a second portion. The distance between the second portion and the first heater is less than the distance between the first portion and the first heater. The control unit controls the first portion and the second portion as one unit when controlling the second heater. The heat quantity entering the area of the container facing the first portion is greater than the heat quantity entering the area facing the second portion.
Inventors:
Yuki Sugawara
Yoshiaki Kazama
Yoshiaki Kazama
Application Number:
JP2019099550A
Publication Date:
March 17, 2023
Filing Date:
May 28, 2019
Export Citation:
Assignee:
Canon Tokki Co., Ltd.
International Classes:
C23C14/24; H05B33/10; H10K50/00
Domestic Patent References:
| JP2019031705A | ||||
| JP2011162846A | ||||
| JP2008305735A | ||||
| JP2014105375A |
Attorney, Agent or Firm:
Patent Attorney Corporation Shuwa Patent Office