Title:
HEATING PROCESSING APPARATUS AND HEATING PROCESSING METHOD
Document Type and Number:
Japanese Patent JP2023133315
Kind Code:
A
Abstract:
To provide an organic film formation apparatus capable of sufficiently eliminating foreign matters inside a chamber and a cleaning method for the organic film formation apparatus.SOLUTION: A heating processing apparatus heat-processes a workpiece supported inside a chamber and surrounded by an even heating section. A heat processing method includes: depressing an inside space of the chamber to a first pressure; heat-processing the workpiece by a heating section; and after the heat processing, performing a first cooling step of cooling the even heating section and a second cooling step of cooling the workpiece, where the second cooling step is started when an inner pressure inside the chamber reaches a second pressure, and the second pressure is closer to the atmospheric pressure than the first pressure.SELECTED DRAWING: Figure 1
Inventors:
KUROIWA KYOTA
MOCHIZUKI YOSUKE
IMAOKA YUICHI
KOBAYASHI NORIAKI
MOCHIZUKI YOSUKE
IMAOKA YUICHI
KOBAYASHI NORIAKI
Application Number:
JP2023111945A
Publication Date:
September 22, 2023
Filing Date:
July 07, 2023
Export Citation:
Assignee:
SHIBAURA MECHATRONICS CORP
International Classes:
F26B5/04; F26B3/28
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