Title:
HIGH FREQUENCY ELECTRODE AND PLASMA TREATING APPARATUS
Document Type and Number:
Japanese Patent JP3763392
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a high frequency electrode in which the influence on the nodes of standing waves generated in a high frequency transmission line is suppressed and to provide a plasma treating apparatus with which satisfactory treatment free from the generation of a plasma distribution is made possible by using the same.
SOLUTION: In the high frequency electrode 1 to be fed with high frequency electric power, recessed parts 2 are formed, and a high frequency transmission line is formed so that high frequency electric power is transmitted from the surface 1a of the high frequency electrode to the surface 1a through the inside surface 2b of the recessed part 2. The recessed parts 2 are formed in the vicinities of the positions of the nodes of standing waves generated in the high frequency transmission line, and the nodes of the standing waves are hidden into the recessed parts 2.
Inventors:
Hiroaki Takeuchi
Application Number:
JP2000236207A
Publication Date:
April 05, 2006
Filing Date:
August 03, 2000
Export Citation:
Assignee:
Sharp Corporation
International Classes:
C23C16/509; H05H1/46; H01L21/205; (IPC1-7): C23C16/509; H01L21/205; H05H1/46
Domestic Patent References:
| JP9268370A |
Attorney, Agent or Firm:
Hidesaku Yamamoto