Title:
HIGHLY ADSORBENT SUPERHYDROPHOBIC SUBSTRATE AND OPERATION OF VERY SLIGHT AMOUNT OF DROPLET USING THE SAME
Document Type and Number:
Japanese Patent JP2010110690
Kind Code:
A
Abstract:
To provide an operation of a very slight amount of droplets using a superhydrophobic substrate which is highly adsorbent, controllable in an adsorbent property, and producible by simple process and a method of producing the substrate.
The highly adsorbent superhydrophobic substrate includes a superhydrophobic pillar structure formed using a hydrophobic polymer on the substrate, wherein the pillar structure is fixed on the substrate with an adhesive and the pillar structure partially contains a hydrophilic metal. The method is for operating droplets using the highly adsorbent superhydrophobic substrate.
More Like This:
| WO/2013/024141 | CALCIUM SORBENT DOPING PROCESS |
| WO/2020/262589 | STIRRING DEVICE |
Inventors:
SHIMOMURA MASATSUGU
YABU HIROSHI
ISHII DAISUKE
YABU HIROSHI
ISHII DAISUKE
Application Number:
JP2008285002A
Publication Date:
May 20, 2010
Filing Date:
November 06, 2008
Export Citation:
Assignee:
UNIV TOHOKU
International Classes:
B01J20/02; B01J19/00; B01J23/44
Domestic Patent References:
| JP2008212864A | 2008-09-18 | |||
| JP2008248181A | 2008-10-16 | |||
| JP2007047541A | 2007-02-22 |
Attorney, Agent or Firm:
Patent Service Corporation Patent Office Sykes