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Title:
HOLLOW APERTURE FOR CHARGED PARTICLE BEAM SYSTEM AND CHARGED PARTICLE BEAM EXPOSURE SYSTEM
Document Type and Number:
Japanese Patent JP2001244170
Kind Code:
A
Abstract:

To provide a hollow aperture, even with having high dimensional accuracy even if the aperture has a very small size by constituting the aperture only of members having simple shapes.

When two unit apertures 61 and 62 are superposed upon another, beam-passing holes 63 are combined and a hollow aperture which has a beam absorbing material 65 at the center, and beam passing holes having partially broken (support sections 64) quasi-doughnut shapes is formed. When this hollow aperture is used as the hollow aperture shown in Fig.1, a quasi-hollow aperture can be formed. By making such a hollow aperture positioned in the cross-over position of a charged particle beam or setting the position in a charged particle beam optical system which is conjugate with the crossover position, the opening angle of the aperture can be limited, and at the same time, coulomb effect can be reduced.


Inventors:
SHIMIZU HIROYASU
UMEMOTO TAKAAKI
Application Number:
JP2000050721A
Publication Date:
September 07, 2001
Filing Date:
February 28, 2000
Export Citation:
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Assignee:
NIKON CORP
International Classes:
G03F7/20; H01J37/09; H01J37/305; H01L21/027; (IPC1-7): H01L21/027; G03F7/20; H01J37/09; H01J37/305
Attorney, Agent or Firm:
Toshiaki Hosoe