How to Form Titanium Nitride Film - 東京エレクトロン株式会社

Title:

How to Form Titanium Nitride Film

Document Type and Number:

Japanese Patent JP6315699

Kind Code:

B2

Abstract:

A method of forming a titanium carbonitride film is provided. In one embodiment, the method of forming the titanium carbonitride film includes performing a cycle a plurality of times to form a titanium carbonitride film. Each cycle performed a plurality of times includes supplying a raw material gas of titanium into a process chamber in which a process object is accommodated, and simultaneously supplying a first gas containing carbon and hydrogen and a second gas containing nitrogen into the process chamber.

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Inventors:

Shigeru Nakajima
Hiromi Shima
Yusuke Tateno

Application Number:

JP2014253789A

Publication Date:

April 25, 2018

Filing Date:

December 16, 2014

Export Citation:

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Assignee:

東京エレクトロン株式会社

International Classes:

C23C16/36; H01L21/28; H01L21/285

Domestic Patent References:

JP2013140946A
JP2007138295A
JP2015082525A
JP2013239700A
JP2012517101A
JP2013076157A
JP2012023399A
JP2011249480A

Foreign References:

US20110128668
US20110128667

Attorney, Agent or Firm:

Yoshiki Hasegawa
Yoshiki Kuroki
Junji Kashiwaoka

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