Title:
METHOD FOR PROCESSING BODY TO BE PROCESSED
Document Type and Number:
Japanese Patent JP2017050506
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To sufficiently suppress the impact of deposition processing of an insulator film, covering a magnetic layer and an isolating layer constituting a magnetic tunnel junction, on the magnetic layer and isolating layer.SOLUTION: A method MT includes a step ST1 of etching in process module PM1, a step ST2 of moving a body to be processed W1 formed by etching from the process module PM1 to process module PM2, and a step ST3 of depositing the body to be processed W1 in the process module PM2. The step ST3 deposits an insulator film between the first surface SF1 and the second surface SF2 of a lamination part 145 by plasma of process gas containing hydrogen. In the step ST3, internal pressure of the process module PM2 is 200 mTorr or more, hydrogen partial pressure of the process module PM2 is 15 mTorr or less, and the steps ST1-ST3 are carried out consistently with oxygen evacuated.SELECTED DRAWING: Figure 6
Inventors:
SAITO YASUHIKO
NEMOTO TAKENAO
NEMOTO TAKENAO
Application Number:
JP2015174978A
Publication Date:
March 09, 2017
Filing Date:
September 04, 2015
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
H01L43/12; C23C16/42; C23C16/50; H01L21/8246; H01L27/105; H01L43/08
Domestic Patent References:
| JP2014075493A | 2014-04-24 | |||
| JP2014063886A | 2014-04-10 | |||
| JP2014060378A | 2014-04-03 | |||
| JP2011238900A | 2011-11-24 |
Foreign References:
| WO2006033166A1 | 2006-03-30 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Junji Kashiwaoka
Yoshiki Kuroki
Junji Kashiwaoka