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Patent Searching and Data


Title:
SEMICONDUCTOR WAFER
Document Type and Number:
Japanese Patent JPH0684734
Kind Code:
A
Abstract:

PURPOSE: To prevent the breakdown of a semiconductor device by a scattered molten wafer material at the time of laser printing by partially recessing the rear surface of a wafer and using the recessed area as the printing area of recognizing symbols with a laser beam.

CONSTITUTION: A recessed section 1 having an arbitrary depth is formed in the orientation flat 3 area of a wafer 2 by grinding or etching the wafer with a grinder or chemical, etc., at the time of machining the wafer 2. The depth of the section 1 is adjusted to the height of a small formed when printing is made with a laser beam. When the depth of the section 1 is set at about 10μm, symbols which are distinctive until the final manufacturing process of a semiconductor device can be printed. Basically, when no semiconductor device is formed on the front surface side of the wafer 2 facing the area 1, a sufficient margin can be obtained. Therefore, even when small are formed when the material of the wafer 2 is melted with a laser beam at the time of printing symbols, the shifting of the pattern of the semiconductor device can be prevented without deteriorating the surface flatness of the water 2.


Inventors:
SATO KENJI
Application Number:
JP23671492A
Publication Date:
March 25, 1994
Filing Date:
September 04, 1992
Export Citation:
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Assignee:
NEC YAMAGATA LTD
International Classes:
H01L21/02; (IPC1-7): H01L21/02
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)