【発明の名称】シリコーン超薄膜の製造方法

Title:

【発明の名称】シリコーン超薄膜の製造方法

Document Type and Number:

Japanese Patent JP2958099

Kind Code:

B2

Abstract:

PURPOSE:To enable the hitherto impossible production of an ultrathin silicone film and to obtain the subject stable ultrathin film layer useful in the field of molecular element by forming a built-up film of a specific amphiphatic siloxane graft copolymer using LB process. CONSTITUTION:An amphiphatic siloxane graft copolymer of formula III is synthesized by copolymerizing a dimethylpolysiloxane having a polymerizable functional group on one terminal and expressed by formula I (R<1> is H or CH3; (n) is 1-150) and a hydrophilic polymerizable monomer of formula II (R<2> is H or CH3) and building up the polymer using LB process to obtain the objective ultrathin film.

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Inventors:

KUNITAKE MASASHI
NAKAJIMA NAOTOSHI
MANABE OSAMU

Application Number:

JP30024690A

Publication Date:

October 06, 1999

Filing Date:

November 06, 1990

Export Citation:

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Assignee:

CHITSUSO KK

International Classes:

B01J19/00; C08F20/34; C08F30/08; C08F220/34; B05D1/20; C08F230/08; C08G77/20; C08G77/22; C08G77/442; C08J5/18; C08L83/04; (IPC1-7): C08G77/442; B01J19/00; B05D1/20; C08J5/18

Attorney, Agent or Firm:

Katsuhiko Nonaka

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