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Patent Searching and Data


Title:
WASTE LIQUID PART OF COATING-DVELOPING DEVICE FOR MANUFACTURING SEMICONDUCTOR
Document Type and Number:
Japanese Patent JPH0750236
Kind Code:
A
Abstract:

PURPOSE: To enable the working efficiency to be improved for cutting down on the manufacturing cost by a method wherein the waste liquid is separated into two parts i.e., gelatinous one and non-gelatinous one in a simple structure so that the non-gelatinous effluent only may be drained into an in-plant concentrated drainage line not to choke up the drainage line thereby making the replacement of a waste liquid tank unnecessary.

CONSTITUTION: The title waste liquid part 1 is composed of plural vessels such as the first overflow vessel 2 and the second vessel 3. In such a simple structure, the working efficiency of the title coating.developing device for manufacturing semiconductor can be improved due to the non-necessity of the replacement of a waste liquid tank. Furthermore, due to the simple structure, the low cost operation can be realized by draining non-gelatinous waste liquid only into an in-plant concentrated drainage line.


Inventors:
TAKEDA HIDENORI
Application Number:
JP19339393A
Publication Date:
February 21, 1995
Filing Date:
August 04, 1993
Export Citation:
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Assignee:
NEC YAMAGATA LTD
International Classes:
H01L21/027; (IPC1-7): H01L21/027
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)