PURPOSE: To shorten a non-operating time of a device by predicting failure of an equipment by comparing the transition tendency of a change pattern with time of an article to be treated with that of a previously stored change pattern with time at a normal time.
CONSTITUTION: The plasma of a reactant gas is formed into a treating chamber 3, in which an article to be treated 4 is housed, and aimed treatment is carried out to the article to be treated 4 by a reaction between the plasma and the article to be treated 4. The first patterns of changes with time of a plurality of observational data at a time when the article to be treated 4 is treated are monitored and stored while a plurality of the transition tendency of the first patterns of changes with time to a plurality of the articles to be treated 4 are monitored, and compared with the second pattern of a change with time of previously stored observational data at a normal time. A means 19 conducting the predicting operation of the failure of an object to be observed and the diagnostic operation of the presence of the abnormality of treatment is provided. Accordingly, the failure of an equipment can be predicted, thus shortening the nonoperating time of a device.
| JP3796857 | METHOD AND DEVICE FOR SURFACE TREATMENT |
| JPH11193466 | PLASMA TREATING DEVICE AND PLASMA TREATING METHOD |
| JP2000164563 | PLASMA PROCESSING DEVICE |
TAMURA NAOYUKI
SHICHIDA HIROYUKI
MAKINO AKITAKA
