METHOD AND APPARATUS FOR INTERNAL MONITORING OF NONCONTACT REAL-TIME DEVICE OF CHAMICAL ETCHING PROCESS

Title:

METHOD AND APPARATUS FOR INTERNAL MONITORING OF NONCONTACT REAL-TIME DEVICE OF CHAMICAL ETCHING PROCESS

Document Type and Number:

Japanese Patent JPH0817790

Kind Code:

A

Abstract:

PURPOSE: To provide a non-contact method and device for monitoring a chemical etching process in the device when etching a work in a wet-type chemical etching bath. CONSTITUTION: A method includes a stage for providing a base 14 with a reference surface, a stage for fixing a work 20 to the base removably, a stage for providing at least two sensors 24a and 24b so that they approach the outer periphery of the surface of the work 20 but do not contact it, and a stage for monitoring electrical characteristics between at least two sensors, thus enabling the change in the provisions of electrical characteristics to indicate the prescribed conditions of an etching process.

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Inventors:

SUTEIIBUN JIYOOJI BAABII
MADABU DATSUTA
TONII FUREDERITSUKU HAINTSU
REEPIN RII
YUUJIN HENRII RATSURAFU
RABUINDORA BUAAMAN SHIENOI

Application Number:

JP14194995A

Publication Date:

January 19, 1996

Filing Date:

June 08, 1995

Export Citation:

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Assignee:

IBM

International Classes:

H01L21/66; H01L21/306; H01L21/3213; (IPC1-7): H01L21/306; H01L21/66

Attorney, Agent or Firm:

Kiyoshi Goda (2 outside)

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