Title:
【発明の名称】Rh、CoまたはIr錯体の存在下でのアクリル(メタクリル)、ビニル、ビニリデンおよびジエンモノマーの制御されたラジカル(共)重合の方法
Document Type and Number:
Japanese Patent JP2866635
Kind Code:
B2
Abstract:
Controlled radical (co)polymerisation of (meth)acrylic, and/or vinylic, and/or vinyl dienic, and/or dienic monomers involves (co)polymerisation of one or more monomers, in bulk, solution, emulsion, or suspension, at a temperature which can go down to 0 degrees C, in the absence of activator, and in the presence of initiating system; the system comprising at least one non-peroxidic radical generator; and at least one catalyst consisting of a metal complex of formula MAa(L)n (I); M = Rh, Co, or Ir; A = halogen, or pseudo-halogen, L = (chiral) ligand selected from cyclooctadiene, P(OR)(OR')(OR"), YRR'R", in which Y = P, N, As, Sb, and YRR', in which Y = O, S, Se, R, R', R" = 1-14C alkyl, possibly substitute by aromatic group, at least two ligands being linked by one or more bivalent radicals; a is integer such that 1 ≤ a ≤ 3; and n is integer such that 1 ≤ n ≤ 5.
Inventors:
FUIRITSUPU DOBOWA
JORUJU MOWANOO
FUIRITSUPU TEIJII
ROBERUTO JEROOMU
TEIERII SENINGAA
JORUJU MOWANOO
FUIRITSUPU TEIJII
ROBERUTO JEROOMU
TEIERII SENINGAA
Application Number:
JP17265897A
Publication Date:
March 08, 1999
Filing Date:
June 27, 1997
Export Citation:
Assignee:
ERUFU ATOKEMU SA
International Classes:
C08F2/24; C08F2/38; C08F4/00; C08F4/04; C08F4/28; C08F4/60; C08F4/72; C08F4/80; C08F12/08; C08F14/00; C08F18/08; C08F20/10; C08F20/14; C08F297/06; (IPC1-7): C08F4/28; C08F2/24; C08F4/00; C08F4/04; C08F4/80; C08F20/14
Domestic Patent References:
| JP9132610A | ||||
| JP6107715A |
Attorney, Agent or Firm:
Yusuke Hiraki (1 person outside)