Title:
【発明の名称】特に化学的残留物で飽和した気体の浄化方法
Document Type and Number:
Japanese Patent JPH11502770
Kind Code:
A
Abstract:
The invention concerns a method of cleaning gases, in particular gases contaminated with chemical residues and particularly gases from print shops. The contaminated gas is extracted from the area where the contamination is produced and fed along pipes to an array of adsorption-filter units which separate the contaminants from the gas and which are isolated from the gas stream at regular intervals to enable them to be regenerated. The adsorber material is regenerated by subjecting it to the action of an agent suitable for cleaning the material. In addition to the number of adsorption-filter units, all being used in the adsorption mode, necessary for the continuous operation of the gas-decontamination process, the method calls for at least one additional unit which can be substituted for one of the other units in accordance with a fixed cycle to enable the substituted unit to be operated in the regeneration mode. The method also calls for at least one further adsorption-filter unit which is used intermittently in a partial adsorber mode and, on completion of its regeneration phase, can be connected in, if the gas flow rate increases, with the at least one additional unit operating in the adsorber mode.
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Inventors:
Helena Liner
Markwald Winfried
Markwald Winfried
Application Number:
JP51153397A
Publication Date:
March 09, 1999
Filing Date:
May 22, 1996
Export Citation:
Assignee:
Firma Maul and Co. Kru.
International Classes:
B01D53/04; B41F33/00; B41J29/377; B41F13/00; (IPC1-7): B01D53/04; B41F13/00; B41F33/00; B41J29/377
Attorney, Agent or Firm:
Hiroyuki Ikeuchi (2 outside)