Title:
【発明の名称】半導体プロセス用超高純度バッファードHFのオンサイト生成
Document Type and Number:
Japanese Patent JP2001527697
Kind Code:
A
Abstract:
A process for preparing ultra-high-purity buffered hydrofluoric acid on-site at a semiconductor manufacturing facility. Anhydrous ammonia is purified by scrubbing (17) in a high-pH liquor, and then combined with high-purity aqueous HF which has been purified by a similar process. The generation is monitored by a density measurement to produce an acid whose pH and buffering are accurately controlled.
Inventors:
Hoffman, Joe Gee
Clark, Earl Scott
Clark, Earl Scott
Application Number:
JP50228497A
Publication Date:
December 25, 2001
Filing Date:
June 05, 1996
Export Citation:
Assignee:
Startech Ventures Incorporated
International Classes:
B01D3/00; B01D1/00; B01D3/02; B01D3/14; B08B7/04; C01B7/07; C01B7/19; C01C1/02; C01C1/16; F26B7/00; H01L21/304; H01L21/306; H01L21/311; (IPC1-7): H01L21/304; B01D3/00; C01B7/19
Attorney, Agent or Firm:
Takehiko Suzue (4 outside)