Title:
投影露光装置のための照明光学アセンブリ
Document Type and Number:
Japanese Patent JP6767970
Kind Code:
B2
Abstract:
An illumination optical assembly for a projection exposure apparatus includes a first facet element having a multiplicity of first facets, which are formed in each case by a multiplicity of displaceable individual mirrors, and a second facet element having a multiplicity of second facets. The displacement positions of the individual mirrors of the first facets are chosen in each case in so that, in the case of a predefined intensity distribution of an illumination radiation in an intermediate focus, the illumination radiation in the region of the facets of the second facet element has an intensity distribution with a maximum which is at most equal to a predefined maximum intensity or which is greater than a mean value of the intensity distribution by at most a predefined factor or absolute value.
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Inventors:
Entres Martin
Being stig
Being stig
Application Number:
JP2017512829A
Publication Date:
October 14, 2020
Filing Date:
August 24, 2015
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B19/00
Domestic Patent References:
| JP2013518419A | ||||
| JP2012519951A | ||||
| JP2014140047A | ||||
| JP2014512677A |
Attorney, Agent or Firm:
Shinichiro Tanaka
Disciple Maru Ken
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Naoki Kondo
Hiroshi Oura
Disciple Maru Ken
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Naoki Kondo
Hiroshi Oura