To provide an illumination system with a variable arrangement position illuminating an irradiated space by efficiently reflecting light from a lighting fixture at a reflection member even in case an arrangement position of the reflection member is changed.
The illumination system with a variable arrangement position includes the reflection member 2 capable of being arranged at an arbitrary position of a partition surface partitioning the irradiated space, and a light source irradiating light on the reflection member 2. The reflection member 2 is composed of a regularly used main reflection plane portion 21 and an auxiliary reflection plane portion 22 which is detachably expanded by gradually being fitted into an outer fringe of the main reflection plane portion 21 in case an irradiated area of a ceiling surface 13 is increased to more than a predetermined value due to increase of a distance between the reflection member 2 and the lighting fixture as a light source.
ABE SHINICHI
FUSHIMI TATSU
HAYAMIZU HIROSHI
MIYAKE YOSHIYUKI
Katsumi Taguchi
Shinichi Mizuta