Imaging and processing to a plasma ion source which were improved

Title:

Imaging and processing to a plasma ion source which were improved

Document Type and Number:

Japanese Patent JP6238570

Kind Code:

B2

Abstract:

Applicants have found that energetic neutral particles created by a charged exchange interaction between high energy ions and neutral gas molecules reach the sample in a ion beam system (299) using a plasma source (202, 201). The energetic neutral create secondary electrons away from the beam impact point. Methods to solve the problem include differentially pumped chambers (206, 210, 214) below the plasma source (202) to reduce the opportunity for the ions to interact with gas.

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Inventors:

Tom Miller
Sean Kellogg
Showin Jahn
Mostafa Marzous
Anthony Graupella

Application Number:

JP2013108815A

Publication Date:

November 29, 2017

Filing Date:

May 23, 2013

Export Citation:

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Assignee:

F-I-I Company

International Classes:

H01J37/317; H01J37/08; H01J37/18

Domestic Patent References:

JP52088900A
JP2011100722A

Foreign References:

US5313067

Attorney, Agent or Firm:

Masahiko Amagai

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