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Title:
浸漬リソグラフィシステムの監視・制御方法及び装置
Document Type and Number:
Japanese Patent JP2007502539
Kind Code:
A
Abstract:
A method of monitoring an immersion lithography system in which a wafer can be immersed in a liquid immersion medium for exposure by an exposure pattern. The method detects the presence of a foreign body in the immersion medium to thereby determine if the immersion medium in a state that is acceptable for exposing the wafer with the exposure pattern. Also disclosed is a monitoring and control system for an immersion lithography system.

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Inventors:
Harry Jay Levinson
Application Number:
JP2006523208A
Publication Date:
February 08, 2007
Filing Date:
July 23, 2004
Export Citation:
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Assignee:
ADVANCED MICRO DEVICES INCORPORATED
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
JPH06168866A1994-06-14
JPH0424535A1992-01-28
JP2004207696A2004-07-22
JPH06124873A1994-05-06
JPH1010036A1998-01-16
JP2005005713A2005-01-06
JP2005277363A2005-10-06
JP2007500449A2007-01-11
Attorney, Agent or Firm:
Masatake Suzuki
Ryota Sano
Yoshito Muramatsu



 
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