Title:
インプリント用テンプレート及びインプリント用テンプレートの製造方法
Document Type and Number:
Japanese Patent JP6965557
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a template for imprint satisfying both request of improvement of contrast of alignment mark at the time of alignment, and prevention of light irradiation of unintended region at the time of imprint, and to provide a manufacturing method thereof.SOLUTION: In a template for imprint having a mesa structure 20 on the principal surface of a light-transmitting base material 10, and having a first uneven structure 21 composing a transfer pattern, and a second uneven structure 22 composing an alignment mark on the upper surface of the mesa structure, a second material film 32 composed of a second material having a refractive index different from that of the first material, and formed on the bottom surface of the recess in the second uneven structure, and on the principal surface 11 of the base material on the outer periphery of the mesa structure.SELECTED DRAWING: Figure 1
Inventors:
Ryuji Nagai
Katsutoshi Suzuki
Koji Ichimura
Koji Yoshida
Katsutoshi Suzuki
Koji Ichimura
Koji Yoshida
Application Number:
JP2017089413A
Publication Date:
November 10, 2021
Filing Date:
April 28, 2017
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
H01L21/027; B29C33/38; B29C59/02
Domestic Patent References:
JP2013519236A | ||||
JP2013069921A | ||||
JP2011146496A | ||||
JP2010258326A | ||||
JP2010258259A | ||||
JP2009023113A |
Attorney, Agent or Firm:
Akihiko Yamashita
Kishimoto Tatsuto
Kishimoto Tatsuto
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