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Title:
ION IMPLANTATION METHOD
Document Type and Number:
Japanese Patent JPH05128994
Kind Code:
A
Abstract:

PURPOSE: To process inner peripheral surfaces of fine tubes or holes of minute diameter with ion implantation effectively.

CONSTITUTION: In a method to irradiate the inner peripheral surface 17a of a hole with ion beams 18 to implant ions, an introducing tube 1 of the ion beams 18 is inserted into the hole, and a voltage opposite to that of the ion beams is applied to the inner peripheral surface 17a (power supply 2) to deflect the ion beams 18 and irradiate the surface 17a at an incident angle perpendicular or nearly perpendicular to the surface 17a. Even inner peripheral surfaces of fine tubes or holes of minute diameter can be irradiated with the ion beams easily, effectively and uniformly at an incident angle nearly 0°. Inner peripheral surfaces of holes of various members can be processed by ion implantation with high ion implantation efficiency. Various characteristics such as hardness, abrasion resistance or corrosion resistance of the processed surface can be improved significantly.


Inventors:
AKIYAMA ISAMU
FUJIHANA TAKANOBU
SATO KOJI
Application Number:
JP28850291A
Publication Date:
May 25, 1993
Filing Date:
November 05, 1991
Export Citation:
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Assignee:
TAKATA CORP
International Classes:
C23C14/48; H01J37/147; H01J37/317; H01L21/265; (IPC1-7): C23C14/48; H01J37/147; H01J37/317; H01L21/265
Attorney, Agent or Firm:
Tsuyoshi Shigeno



 
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