Title:
イオン注入システム用の、リップを有するイオン源ライナー
Document Type and Number:
Japanese Patent JP6959914
Kind Code:
B2
Abstract:
An ion source has an arc chamber having a body defining and interior region. A liner defined an exposure surface of the interior region that is exposed to a plasma generated within the arc chamber. An electrode has a shaft with a first diameter that passes through the body and the liner. The electrode is electrically isolated from the body where the liner is a plate having a first surface with an optional recess having a second surface. A hole is defined through the recess for the shaft to pass through. The hole has a second diameter that is larger than the first diameter, and an annular gap exists between the plate and the shaft. The plate has a lip extending from the second surface toward the first surface that surrounds the hole within the recess and generally prevents particulate contaminants from entering the annular gap.
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Inventors:
Corvin, Neil Kay.
Che, Tse Jen
Che, Tse Jen
Application Number:
JP2018521060A
Publication Date:
November 05, 2021
Filing Date:
November 04, 2016
Export Citation:
Assignee:
AXCELIS TECHNOLOGIES, INC.
International Classes:
H01J27/08; H01J37/08; H05H1/48
Domestic Patent References:
| JP2010073387A | ||||
| JP2014044886A |
Foreign References:
| US20150179393 |
Attorney, Agent or Firm:
Harakenzo world patent & trademark