Title:
LAMINATED FILM
Document Type and Number:
Japanese Patent JP2014000782
Kind Code:
A
Abstract:
To provide a laminated film which has high denseness with few defects such as fine voids and cracks.
The laminated film including a substrate and a thin-film layer which is formed on at least one surface of the substrate and contains silicon atoms, oxygen atoms, and carbon atoms is characterized in that the thin-film layer is formed by a plasma chemical vapor deposition method using a raw material gas containing an inorganic silane-based gas, a hydrocarbon-based gas, and an oxygen gas. The thin-film layer is preferably formed using a rare gas, an oxygen gas, or their mixture as a discharge gas.
Inventors:
YAMASHITA TAKAHIRO
KURODA TOSHIYA
SANADA TAKASHI
KURODA TOSHIYA
SANADA TAKASHI
Application Number:
JP2012139466A
Publication Date:
January 09, 2014
Filing Date:
June 21, 2012
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
B32B9/00; C23C16/30
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto