Title:
LASER ANNEALING TREATMENT DEVICE
Document Type and Number:
Japanese Patent JP3513730
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To prevent the degradation in treatment efficiency by the evaporated material generated from an object to be treated.
SOLUTION: The inside of a vacuum chamber 1 is evacuated to vacuum and a gaseous plasma source 13 is supplied therein from a gas supplying pipe 12. A high frequency is generated from a high frequency generator 10 and is applied on high-frequency electrodes 9a, 9B to generate high-frequency plasma on the inner side of the vacuum chamber 1 of a laser introducing window 5. The stains of the laser introducing window 5 are removed by plasma etching. The degradation in the treatment efficiency by the stains of the laser introducing window 5 is prevented and quality and throughput are improved.
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Inventors:
Sawai, Yoshiki
Kanazawa, Masahito
Ishizaka, Shinichi
Kanazawa, Masahito
Ishizaka, Shinichi
Application Number:
JP29847195A
Publication Date:
March 31, 2004
Filing Date:
November 16, 1995
Export Citation:
Assignee:
JAPAN STEEL WORKS LTD:THE
International Classes:
B01J19/12; C30B33/02; H01L21/268; (IPC1-7): C30B33/02; B01J19/12; H01L21/268
Attorney, Agent or Firm:
有近 紳志郎
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