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Patent Searching and Data


Title:
LAYOUT METHOD FOR SEMICONDUCTOR INTEGRATED CIRCUIT
Document Type and Number:
Japanese Patent JPH0816649
Kind Code:
A
Abstract:

PURPOSE: To accurately design an integrated circuit for the standard cell or building block system of an analog system in a short time.

CONSTITUTION: This method is provided with a process A for performing logical design based on a specification, process B for performing circuit design at a transistor level based on this logical design, process C for preparing a symbol drawing at a microlevel based on this circular diagram information, process D for performing floor planning for arranging the blocks of macro assemblies of the chips of the assemblies of these blocks based on this symbol drawing, process E for performing macro layout based on the result of the process B, process G for arranging the chips of plural macro assemblies based on this layout, and process H for comparing the layout result from the process E to G with the result of the process D and performing correction when both the results are not matched.


Inventors:
NIIYAMA SHINYA
Application Number:
JP15096794A
Publication Date:
January 19, 1996
Filing Date:
July 01, 1994
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
H01L21/82; G06F17/50; (IPC1-7): G06F17/50; H01L21/82
Attorney, Agent or Firm:
Teiichi