Title:
LEARNING DEVICE, INFORMATION PROCESSING DEVICE, SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING SYSTEM, LEARNING METHOD, AND PROCESSING CONDITION DETERMINATION METHOD
Document Type and Number:
Japanese Patent JP2023141070
Kind Code:
A
Abstract:
To perform machine learning of a condition that changes with the elapse of time in order to process a substrate.SOLUTION: A learning device 200 includes: an experimental data acquisition part 261 for acquiring a processing amount showing the difference of film thickness before and after processing a coating film formed on a substrate after a substrate processing device for processing the substrate by supplying process liquid to the substrate with the coating film formed is driven under a processing condition including a variation condition that changes with the lapse of time; a first compression part 263 for converting the variation condition so as to reduce the number of dimensions; and predictor generation part 265 for generating a learning model for performing machine learning of learning data including a conversion result obtained by converting the variation condition by the first compression part 263 and a processing amount corresponding to the processing condition and estimating a processing amount showing the difference of film thickness before and after processing the coating film formed on the substrate before being processed by the substrate processing device.SELECTED DRAWING: Figure 4
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Inventors:
TOKUYAMA MASAHIRO
Application Number:
JP2022047203A
Publication Date:
October 05, 2023
Filing Date:
March 23, 2022
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD
International Classes:
H01L21/306
Attorney, Agent or Firm:
Masahiro Nakagawa
Go Sakane
Hideyuki Sawamura
Go Sakane
Hideyuki Sawamura
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