Title:
MANUFACTURING METHOD OF Co-BASE SINTERED ALLOY SPUTTERING TARGET FOR FORMING MAGNETIC RECORDING FILM OF LOW RELATIVE MAGNETIC PERMEABILITY
Document Type and Number:
Japanese Patent JP2009108336
Kind Code:
A
Abstract:
To provide a manufacturing method of a Co-base sintered alloy sputtering target for forming a magnetic recording film of low relative magnetic permeability.
First CoCr alloy powder having composition containing 50-70 atom% Cr and the balance Co, second CoCr alloy powder having composition containing 5-15 atom% Cr and the balance Co, Pt powder and non-magnetic oxide powder are mixed so as to get the composition containing 0.5-15 mol% non-magnetic oxide, 4-20 mol% Cr, and 5-25 mol% Pt and the balance Co and inevitable impurities, and the mixture is pressure-sintered. Either of or both of the first CoCr alloy powder and the second CoCr alloy powder may further contain 0.5-8 atom% B.
Inventors:
NONAKA SOHEI
KOMIYAMA SHOZO
KOMIYAMA SHOZO
Application Number:
JP2007278315A
Publication Date:
May 21, 2009
Filing Date:
October 26, 2007
Export Citation:
Assignee:
MITSUBISHI MATERIALS CORP
International Classes:
C23C14/34; B22F1/00; B22F3/14; B22F3/15; C22C1/04; C22C19/07; C22C27/06
Domestic Patent References:
| JPH04297572A | 1992-10-21 | |||
| JP2000038661A | 2000-02-08 | |||
| JP2000282229A | 2000-10-10 |
Foreign References:
| WO2007116834A1 | 2007-10-18 |
Attorney, Agent or Firm:
Kazuo Tomita
Kutaro Kamoi
Kageyama Shuichi
Kutaro Kamoi
Kageyama Shuichi