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Title:
MANUFACTURE OF BORON NITRIDE COATED FILM BY CHEMICAL VAPOR DEPOSITION
Document Type and Number:
Japanese Patent JPS5547379
Kind Code:
A
Abstract:

PURPOSE: To form boron nitride coating having high purity and high density on a substrate contg. iron group metals at ordinary press. and at a temp. lower than that for conventional method, by introducing a reaction gas contg. NH3, BCl3 etc. on the substrate so as to metallize the substrate chemically.

CONSTITUTION: A reaction gas is brought into contact with a heated substrate contg. iron group elements in respective ranges of flow rate of components, i.e., 0.2W3.0ml/sec. NH3 or N2H4, 0.5W1.0ml/sec. BCl3 or B2H6, 0.2W4.0ml/sec. H2, and 0.2W4.0ml/sec. inert gas such as Ar. Hereby a coating of hexagonal system crystals of boron nitride 2 μm in thickness are formed on the substrate by chemical metallizing. The thickness of the coating increases linearly with increase in the metallizing time to form a coating not smaller than 500μm in thickness. For the substrate is used an alloy or a cpd. including a single iron group element, e.g., iron, cobalt, or two or more members of iron group elements.


Inventors:
TAKAHASHI TAKEHIKO
ITOU HIDEAKI
Application Number:
JP12038978A
Publication Date:
April 03, 1980
Filing Date:
October 02, 1978
Export Citation:
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Assignee:
TAKAHASHI TAKEHIKO
ITO HIDEAKI
International Classes:
C23C16/34; (IPC1-7): C23C11/08



 
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